OTTELIA is the intelligent point-of-use solution for the reliable removal of silicon dioxide particles (SiO₂) from process wastewater in semiconductor manufacturing. Thanks to a state-of-the-art combination of sedimentation and filtration, OTTELIA enables direct water reuse, reduces fresh water consumption, lowers operating costs and supports companies in achieving their sustainability and ESG goals. With its compact design, high separation efficiency and flexible scalability, OTTELIA can be seamlessly integrated into existing production and waste gas treatment systems.